B.TECH. IN ELECTRONICS ENGINEERING (VLSI DESIGN AND TECHNOLOGY)labelective
SEMICONDUCTOR FABRICATION AND CHARACTERIZATION LAB
ECE 3244
Syllabus
- 01Thermal oxidation of silicon wafer
- 02Diffusion of impurities in silicon wafer
- 03Photolithography for various mask patterns and photoresists
- 04Lift-off with thermal evaporation
- 05Wet etching of silicon wafers
- 06Resistors
- 07MOSCAPs
- 08MOSFETs and diodes
- 09Electrical characterizations: I-V, C-V, sheet resistance
- 10Morphological characterizations: microscope, thickness measurement using optical (oxide layer) and step (metal layer) method
References
- Li, Lin, Ashok Kumar Materials Characterization Techniques Sam Zhang; CRC Press, (2008)
- Murphy, Douglas B, Fundamentals of Light Microscopy and Electronic Imaging, Wiley-Liss, Inc. USA, (2001)
- Tyagi, A.K., Roy, Mainak, Kulshreshtha, S.K., and Banerjee, S., Advanced Techniques for Materials Characterization, Materials Science Foundations (monograph series), Volumes 49 – 51, (2009)
- Wachtman, J.B., Kalman, Z.H., Characterization of Materials, Butterworth Heinemann, (1993)
Credits Structure
0Lecture
0Tutorial
3Practical
1Total